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教授 博士生导师
招生学科专业:
机械工程 -- 【招收博士、硕士研究生】 -- 机电学院
航空宇航科学与技术 -- 【招收硕士研究生】 -- 机电学院
机械 -- 【招收博士、硕士研究生】 -- 机电学院
毕业院校:南京航空航天大学
学历:南京航空航天大学
学位:工学博士学位
所在单位:机电学院
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The effects of nitrogen partial pressure on the microstructure of amorphous carbon nitride films
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所属单位:机电学院
发表刊物:INTEGRATED FERROELECTRICS
关键字:Amorphous carbon nitride films RFMS nitrogen partial pressure microstructure mechanical properties
摘要:The amorphous carbon nitride (a-CNx) films with varying nitrogen content were deposited on Si (100) wafers substrates using radio frequency magnetron sputtering (RFMS) from graphite target at different nitrogen partial pressure. The influence of nitrogen partial pressure on the microstructure and phase composition of a-CNx films were researched systematically. The films were characterized by atom force spectroscopy (AFM), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). AFM results showed cluster structure in a range of tens to hundreds namometers existed on the surface of the films and the surface roughness increased with the increase of nitrogen partial pressure. Ratio of I-D/I-G increased with the nitrogen partial pressure, while the sp(3) phase content from fitting results of XPS displayed reverse trend. The nanohardness of a-CNx films characterized by nanoindentation test decreased with the increase of nitrogen partial pressure, which consisted with the results of Raman and XPS. Thus high nitrogen partial pressure caused the mechanical properties of a-CNx films decrease.
ISSN号:1058-4587
是否译文:否
发表时间:2017-01-01
合写作者:吴金鑫,叶鹏,唐晓龙,左敦稳
通讯作者:徐锋,左敦稳,徐锋