Affiliation of Author(s):材料科学与技术学院

Journal:JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

Key Words:DIAMOND-LIKE CARBON OPTICAL-PROPERTIES THIN-FILMS SUBSTRATE-TEMPERATURE PLASMA CVD DEPOSITION GROWTH DILUTION

Abstract:Optical and electrical properties of amorphous carbon (a-C) films are important for their applications in transparent conductive electrodes (TCEs). In this work, we present a systematic study about the influence of hydrogen (H-2) on the structural, optical and electrical properties of a-C films deposited on quartz glass by hot-filament chemical vapor deposition (HFCVD) using acetylene (C2H2) as carbon source. The samples were characterized by means of Raman spectroscopy, X-ray photoelectron spectroscopy, atomic force microscopy, UV-Vis-NIR spectroscopy and Hall-effect measurement. The results showed that the properties of a-C films were strongly dependent on the H-2/(H-2 + C2H2) ratio. The a-C films deposited at 750 A degrees C by HFCVD exhibited tunable transmittance of 50-80%, optical gap of 1.5-1.7 eV, resistivity of 400-1200 a"broken vertical bar cm and carrier mobility of 1-7 cm(2)/(V s) with changing H-2/(H-2 + C2H2) ratio from 20 to 80%. The present investigation gives a strategy to adjust the properties of a-C films for TCEs.

ISSN No.:0957-4522

Translation or Not:no

Date of Publication:2018-08-01

Co-author:翟子豪,陈洁仪,孙孪鸿

Correspondence Author:shl