Affiliation of Author(s):材料科学与技术学院

Journal:APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING

Key Words:SURFACE AL2O3 DEPOSITION

Abstract:Though black silicon has excellent anti-reflectance property, its passivation is one of the main technical bottlenecks due to its large specific surface area. In this paper, multicrystalline black silicon is fabricated by metal assisted chemical etching, and is rebuilt in low concentration alkali solution. Different solution pre-treatment is followed to make surface modification on black silicon before Al2O3 passivation by atomic layer deposition. HNO3 and H2SO4+H2O2 solution pre-treatment makes the silicon surface become hydrophilic, with contact angle decrease from 117.28 degrees to about 30 degrees. It is demonstrated that when the pre-treatment solution is nitric acid, formed ultrathin SiOx layer between Al2O3 layer and black silicon is found to increase effective carrier lifetime to 72.64 mu s, which is obviously higher than that of the unpassivated black silicon. The passivation stacks of SiOx/Al2O3 are proved to be effective double layers for nanoscaled multicrystalline silicon surface.

ISSN No.:0947-8396

Translation or Not:no

Date of Publication:2018-04-01

Co-author:蒲天,郑超凡

Correspondence Author:shl