Experimental research on semiconductor shaping by abrasive-spark hybrid machining

Affiliation of Author(s):机电学院

Journal:INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY

Key Words:DWS WEDM Hybrid machining Shape cutting Semiconductor

Abstract:In this study, the problem of poor precision and low efficiency in shape-cutting hard, brittle semiconductor materials with traditional fixed abrasive diamond wire sawing (DWS) is investigated experimentally and a novel approach, which combines electric discharge and diamond abrasive grinding into a single process, is proposed. Experiments with polycrystalline silicon materials are conducted to contrast abrasive-spark hybrid machining, diamond wire sawing, and wire electrical discharge machining (WEDM). The results show that, under the same processing conditions, the shape accuracy of abrasive-spark hybrid machining is the highest and cylindricity error is as the lowest, at 11 mu m. In comparison with WEDM, the damage-layer thickness of machined surfaces is reduced by 10 mu m. Among three processing methods, hybrid machining has the minimum wire bending and wider kerf. The thickness of damage layer and the surface roughness of hybrid machining are in the middle. The surface topography is composed of shallow discharge pits and grinding areas, and there are few scratches on the cut surface compared to diamond wire-cut surfaces, such that this new machining method is found to be more suitable for shape-cutting hard and brittle semiconductor materials.

ISSN No.:0268-3768

Translation or Not:no

Date of Publication:2018-02-01

Co-author:周威威,张斌,Qiu Mingbo,陈浩然,Lida Shen

Correspondence Author:lzd

Date of Publication:2018-02-01