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个人信息Personal Information
教授 博士生导师
招生学科专业：
机械工程 -- 【招收博士、硕士研究生】 -- 机电学院
航空宇航科学与技术 -- 【招收硕士研究生】 -- 机电学院
机械 -- 【招收博士、硕士研究生】 -- 机电学院
毕业院校：南京航空航天大学
学历：南京航空航天大学
学位：工学博士学位
所在单位：机电学院
电子邮箱：
The effect of deposition parameters on microstructure and properties of cBN films by linear ion source assisted RFMS
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所属单位：机电学院
发表刊物：INTEGRATED FERROELECTRICS
关键字：cBN film deposition temperature bias voltage ALLIS residual stress
摘要：Cubic boron nitride (cBN) films were prepared by Anode Layer Linear Ion Source (ALLIS) assisted Radio Frequency Magnetron Sputtering (RFMS) method, and the effect of deposition temperature and substrate bias voltage on the phase component, surface morphology and nanohardness was investigated. In the experiment, the critical deposition temperature of 700 degrees C and bias voltage of -200 V were obtained as the threshold for the formation of cBN. The cBN content in the film increased with the increase of deposition temperature, while it gradually decreased when the bias voltage exceeded -210 V. Finally, cBN films were deposited at 900 degrees C and -210 V with varying ALLIS power, and the residual stress in the as-deposited films was calculated. The result indicated that cBN films with low residual stress can be obtained with ALLIS at high temperature and appropriate bias voltage.
ISSN号：1058-4587
是否译文：否
发表时间：2019-05-04
合写作者：Tian, Shuai,Ye, Peng,Wu, Jinxin,Tu, Luqiang,左敦稳,路元刚
通讯作者：徐锋