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所属单位：材料科学与技术学院

发表刊物：OXIDATION OF METALS

关键字：gamma-TiAl Double-glow plasma surface metallurgy technique Ta-modified layer High-temperature oxidation resistance

摘要：A Ta-modified layer was prepared on gamma-TiAl by double-glow plasma surface metallurgy technique. Based on the results of high-temperature oxidation tests at 700, 800, and 900 degrees C, we studied the morphology, depth profile, and phase of gamma-TiAl and Ta-modified layer by scanning electron microscopy, energy spectrum analysis, and X-ray diffraction analysis. Results showed that the Ta-modified layer was tightly bonded to the substrate without voids and cracks, consisting of the alpha-Ta outer layer and inner diffusion layer. It was found that the isothermal oxidation kinetic curves of the TiAl with the Ta-modified layer followed the parabolic rate law. Ta element promoted the diffusion of Al and formation of uniformly mixed Al2O3/Ta2O5 films, which prevented the inward diffusion of oxygen and help to the improved high-temperature oxidation resistance.

ISSN号：0030-770X

是否译文：否

发表时间：2019-10-01

合写作者：张平则,Yan, Yuqin,Chen, Xiaohu,Li, Fengkun,汪诗园,姚正军

通讯作者：魏东博