沈理达Lida Shen

教授

教授 博士生导师 硕士生导师

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所在单位:机电学院

职务:教授

学历:南京航空航天大学

办公地点:明故宫校区4号楼

主要任职:南京航空航天大学增材制造研究所执行所长

其他任职:南航无锡研究院增材制造研究所所长、江苏省数字化医疗装备技术重点实验室副主任

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Preparation of Metal Nanoparticles by Jet Electrodeposition Using Monocrystalline Silicon Substrate

发布时间:2018-11-13 点击次数:

所属单位:机电学院
发表刊物:INTERNATIONAL JOURNAL OF ELECTROCHEMICAL SCIENCE
关键字:jet electrodeposition nanoparticles surface roughness current density cathode translational speed
摘要:This study proposes a method for rapid preparation of nanoparticles (NPs) by jet electrodeposition on silicon substrate. Micropyramidal structures were formed on a specific crystallographic plane of monocrystalline silicon substrate after polishing and alkali treatment. With cathode translational motion and high current density, jet electrodeposition discharged metal ions into atoms that rapidly assembled at the tip of silicon micropyramids to form nuclei and generate NPs. The effects of surface roughness, current density, and cathode translational speed on NP size and distribution uniformity were investigated by using copper NPs as the research object. NP size distribution rules for different parameters were obtained by the field emission scanning electron microscopic image analysis and optimized process parameters. Results showed that low silicon substrate roughness was favored preparation of copper NPs with good size refinement and uniform size distribution. Moreover, these NPs exhibited desirable refinement and uniformity when the current density was 200 A/dm(2) and cathode translational speed 480 mm/min.
ISSN号:1452-3981
是否译文:
发表时间:2017-10-01
合写作者:卓威,邱明波,田宗军,汪川
第一作者:沈理达
通讯作者:沈理达