Haihong Qin

Doctoral Degree in Engineering

博士毕业

南京航空航天大学

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Gender:Male
Business Address:将军路校区东区D12-C楼(电气楼)420室
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Home > Scientific Research > Paper Publications

Influences of circuit mismatch on Paralleling Silicon Carbide MOSFETs

Date of Publication:2017-01-01 Hits:

Affiliation of Author(s):自动化学院
Journal:PROCEEDINGS OF THE 2017 12TH IEEE CONFERENCE ON INDUSTRIAL ELECTRONICS AND APPLICATIONS (ICIEA)
Key Words:Silicon carbide MOSFET Parallel Circuit Mismatch
Abstract:Current sharing is a major problem for paralleling devices, which can affect the performance and reliability of devices. In this paper, the factors leading to current unbalance in paralleling silicon carbide (SiC) MOSFETs are analyzed, especially the circuit mismatch. A double pulse test circuit based on SiC MOSFET is established for testing the circuit mismatch including common source stray inductance (L-S), switching loop stray inductance (L-D) and the gate driver resistance (R-G). The experimental results verify the influences caused by circuit mismatch on the current sharing in paralleling devices.
ISSN No.:2156-2318
Translation or Not:no
Date of Publication:2017-01-01
Co-author:Zhang Ying,Zhu Ziyue,F70206579,fdf,Wang Shishan,Zhao Chaohui
Correspondence Author:Haihong Qin