Affiliation of Author(s):机电学院
Journal:INTERNATIONAL JOURNAL OF ELECTROCHEMICAL SCIENCE
Key Words:jet electrodeposition nanoparticles surface roughness current density cathode translational speed
Abstract:This study proposes a method for rapid preparation of nanoparticles (NPs) by jet electrodeposition on silicon substrate. Micropyramidal structures were formed on a specific crystallographic plane of monocrystalline silicon substrate after polishing and alkali treatment. With cathode translational motion and high current density, jet electrodeposition discharged metal ions into atoms that rapidly assembled at the tip of silicon micropyramids to form nuclei and generate NPs. The effects of surface roughness, current density, and cathode translational speed on NP size and distribution uniformity were investigated by using copper NPs as the research object. NP size distribution rules for different parameters were obtained by the field emission scanning electron microscopic image analysis and optimized process parameters. Results showed that low silicon substrate roughness was favored preparation of copper NPs with good size refinement and uniform size distribution. Moreover, these NPs exhibited desirable refinement and uniformity when the current density was 200 A/dm(2) and cathode translational speed 480 mm/min.
ISSN No.:1452-3981
Translation or Not:no
Date of Publication:2017-10-01
Co-author:卓威,Qiu Mingbo,tzj,汪川
Correspondence Author:Lida Shen