Investigation of substrate temperature and cooling method on the properties of amorphous carbon films by hot-filament CVD with acetylene
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- 所属单位：材料科学与技术学院
- 发表刊物：CARBON
- 关键字：DIAMOND-LIKE CARBON CHEMICAL-VAPOR-DEPOSITION PULSED-LASER DEPOSITION RAMAN-SPECTROSCOPY GRAPHENE GROWTH PRESSURE HWCVD HFCVD BEAM
- 摘要：A study based on the structural, optical and electrical properties of amorphous carbon (a-C) films by hot filament chemical vapor deposition (HFCVD) with acetylene is reported. Effect of substrate temperature ranging from 450 degrees C to 850 degrees C and cooling method "including hydrogen, argon and furnace cooling was mainly investigated. The structural transitions from a-C to nanocrystalline graphite (nc-G) and from nc-G to graphite were observed by raising substrate temperature. Hydrogen content in a-C films decreased sharply as the temperature increased from 450 degrees C to 550 degrees C, which corresponded to the high growth rate and large roughness at 550 degrees C. The influence of cooling method on properties of a-C films was attributed to different compressive stress produced by the volume shrinkage during cooling process. The films grown at 850 degrees C followed by hydrogen cooling exhibited the best performance with an optical gap of 1.2 eV, a mobility of 3.18 cm(2)/(V.s) and an electrical resistivity of 7.79 x 10(-3) Omega.cm, which were comparable to the reported properties of a-C films by other methods. These results indicated that HFCVD is a good method to synthesize high quality a-C films. (C) 2017 Elsevier Ltd. All rights reserved.
- ISSN号：0008-6223
- 是否译文：否
- 发表时间：2017-06-01
- 合写作者：翟子豪,陈洁仪
- 通讯作者：沈鸿烈
- 发表时间：2017-06-01
