Affiliation of Author(s):材料科学与技术学院

Journal:CARBON

Key Words:DIAMOND-LIKE CARBON CHEMICAL-VAPOR-DEPOSITION PULSED-LASER DEPOSITION RAMAN-SPECTROSCOPY GRAPHENE GROWTH PRESSURE HWCVD HFCVD BEAM

Abstract:A study based on the structural, optical and electrical properties of amorphous carbon (a-C) films by hot filament chemical vapor deposition (HFCVD) with acetylene is reported. Effect of substrate temperature ranging from 450 degrees C to 850 degrees C and cooling method "including hydrogen, argon and furnace cooling was mainly investigated. The structural transitions from a-C to nanocrystalline graphite (nc-G) and from nc-G to graphite were observed by raising substrate temperature. Hydrogen content in a-C films decreased sharply as the temperature increased from 450 degrees C to 550 degrees C, which corresponded to the high growth rate and large roughness at 550 degrees C. The influence of cooling method on properties of a-C films was attributed to different compressive stress produced by the volume shrinkage during cooling process. The films grown at 850 degrees C followed by hydrogen cooling exhibited the best performance with an optical gap of 1.2 eV, a mobility of 3.18 cm(2)/(V.s) and an electrical resistivity of 7.79 x 10(-3) Omega.cm, which were comparable to the reported properties of a-C films by other methods. These results indicated that HFCVD is a good method to synthesize high quality a-C films. (C) 2017 Elsevier Ltd. All rights reserved.

ISSN No.:0008-6223

Translation or Not:no

Date of Publication:2017-06-01

Co-author:翟子豪,陈洁仪

Correspondence Author:shl