Doctoral Degree in Engineering

南京航空航天大学

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Laser-induced damage threshold in HfO2/SiO2) multilayer films irradiated by β-ray

Date of Publication:2019-01-01 Hits:

Affiliation of Author(s):航天学院
Journal:Chin. Phys.
Abstract:Post-processing can effectively improve the resistance to laser damage in multilayer films used in a high power laser system. In this work, HfO2/SiO2 multilayer films are prepared by e-beam evaporation and then β-ray irradiation is employed as the post-processing method. The particle irradiation affects the laser induced damage threshold (LIDT), which includes defects, surface roughness, packing density and residual stress. The residual stress that is relaxed during irradiation changes from compressive stress into tensile stress. Our results indicate that appropriate tensile stress can improve LIDT remarkably. In view of the fact that LIDT rises from 8 J/cm2 to 12 J/cm2, i.e., 50% increase, after the film has been irradiated by 2.2 × 1013/cm2 β-ray, the particle irradiation can be used as a controllable and desirable post-processing method to improve the resistance to laser induced damage. © 2019 Chinese Physical Society and IOP Publishing Ltd.
ISSN No.:1674-1056
Translation or Not:no
Date of Publication:2019-01-01
Co-author:Tian, Peng-Yu,Zhu, Mao-Dong,Qi, Hong-Ji,Fei, Tao,lvjinpeng,Liu, Hui-Ping
Correspondence Author:fmh